Mentor Graphics Calibre MAPI IC制造

Calibre MAPI provides the basis for user programming of customized applications. The command set includes a user controlled random search by pattern characteristics like size, type (line, contact), direction and tone. In addition a local search is available to validate previously defined locations. Further functions are provided to reduce a matching set of patterns to a desired number and distribution across the mask. For each location layout parameters can be extracted along with images in different formats and output in files formatted in accordance with the equipment requirements.

Key Benefits :

• Increase efficiency and reliability of the measurement process by linking mask layout data to metrology and inspection systems
• Improve workflow by bridging from Calibre analysis programs
• Streamline application development with code reuse
• Quickly customize metrology applications from basic tasks
• Maintain consistency, and minimize redundancy in metrology applications

Major Product Features :

• Object-oriented iTCL classes and functions for good interface design and specialized modification of existing metrology programs
• Drives manufacturing machines using data derived from layout
• Dedicated functions supporting the extraction and validation of suitable locations for mask metrology
• Easy adoption into existing flows