Calibre OPCverify FEATURES AND BENEFITS:
- Accurate wafer contour simulation for advanced process conditions, including immersion litho
- Supports a variety of OPC usage models, including OPC recipe verification, mask sign-off, litho-friendly design, VT5 and optical
- Predefined and customizable scripts for CD errors, spacing errors, bridging and pinching checks, and two-layer checks
- Easily customized and integrated into existing flows
- Calibre hierarchical polygon processing engine provides a single, accurate modeling foundation for all litho simulations
- High processing scalability assures necessary turn-around-time for mask operations
- No dedicated hardware; runs on all leading platforms
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