Calibre nmMPC handles long, medium and short range effects with a combination of density-based bias models and variable etch bias (VEB) calibrated models based on physical mask measurements. Calibre nmMPC also includes tools for mask model building and customization that are integrated with calibre workbench.
The Calibre Mask Process Correction solution applies Mentor’s model-based OPC technology with optimizations specifically developed for e-beam mask writers. New correction and modeling capabilities, including both density-based and Variable Etch Bias modeling, improve mask CD linearity and uniformity for advanced nodes. The solution also includes tools for mask model building and customization integrated with Calibre Workbench. To round out Mentor’s complete mask synthesis solution, the Calibre platform includes tools for mask rule-checking and sign-off, fracturing, and data conversion for the leading e-beam mask writing equipment.