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Mentor Graphics Calibre nmMPC IC制造
  • Mentor Graphics Calibre nmMPC IC制造

Mentor Graphics Calibre nmMPC IC制造

明导国际(MentorGraphics)Mentor是全球著名的EDA工具厂商,提供芯片与系统开发所需的各种设计、仿真与制造工具,与Synopsys和Cadence并称全球三大EDA公司。其2015年营收在12亿美元左右,营运利润约为

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Calibre nmMPC
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Calibre nmMPC handles long, medium and short range effects with a combination of density-based bias models and variable etch bias (VEB) calibrated models based on physical mask measurements. Calibre nmMPC also includes tools for mask model building and customization that are integrated with calibre workbench.

The Calibre Mask Process Correction solution applies Mentor’s model-based OPC technology with optimizations specifically developed for e-beam mask writers. New correction and modeling capabilities, including both density-based and Variable Etch Bias modeling, improve mask CD linearity and uniformity for advanced nodes. The solution also includes tools for mask model building and customization integrated with Calibre Workbench. To round out Mentor’s complete mask synthesis solution, the Calibre platform includes tools for mask rule-checking and sign-off, fracturing, and data conversion for the leading e-beam mask writing equipment.

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