Calibre WORKbench can also be used for advanced cell library design and is tightly-integrated with popular layout editors. Features of Calibre WORKbench include:
- Supports standard and customized illumination source types (tophat, annular, quadruple, QUASAR, dipole, custom).
- Thin film stack generation for high-NA vector modeling, TCCcalc.
- Fast layout viewer integrated with lithography simulators and editors supports GDSII and fracture formats.
- Advanced process models (photoresist, etch …) with default or user defined convolution shapes and image parameters enabled through VT5.
- Simulated layout views: optical-intensity map, printed image on wafer, fragmentation sites, 2D cross-section intensity maps, multilevel print-image contours.
- Supports execution of Calibre batch tools on small, selected regions for rapid testing.